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Compensated Phase Locked Oscillator (CPLO)

Thin Film Fabrication and Characterization, Stanford University

Seok-Won Lee and W.D. Hinsberg at the IBM Almaden Research Laboratory, working with K. Kanazawa at Stanford University have used a Compensated Phase Locked Oscillator (CPLO) to measure the frequency and resistance changes following the immersion of a lithographic polymer into a solvent. The experimental points are shown as the red circles in the figure below. In accordance with a model proposed by Hinsberg and Lee where a thin gel layer is formed at the film/liquid interface, the predictions of the physical theory are shown by the solid blue line. This example shows the value of having proper QCM instrumentation for capturing accurate empirical data and the value of having a method by which data can be compared to a theoretical model