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Materials Processing/Preparation Facilities

  • Millipore Nanopure Water System

    A Millipore Nanopure water system produces ion-free water for use in materials processing, cleaning, and film fabrications.

  • Plasma cleaner

    A Gabler Labor Instrumente Plasma Prep5 plasma cleaner is available for substrate cleaning before and during processing. This system can generate plasmas with air, oxygen, argon, or any other non-reactive gas. Organic samples may not be used in this system.

  • Plasma Etcher

    A Technics Micro RIE 800-II parallel plate electrode plasma etcher is available for substrate and materials cleaning. This plasma etcher is dedicated to use with organic materials.